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Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

Type:
Journal
Info:
Mater. Adv., 2020, DOI: 10.1039/D0MA00666A
Date:
2020-10-03
DOI:
http://dx.doi.org/10.1039/D0MA00666A

Author Information

Name Institution
Jerome W. F. InnocentUniversity of Bath
Mari NapariUniversity of Cambridge
Andrew L. JohnsonUniversity of Bath
Thom R. Harris-LeeUniversity of Bath
Miriam RegueImperial College London
Timo SajavaaraUniversity of Jyväskylä
Judith L. MacManus-DriscollUniversity of Cambridge
Frank MarkenUniversity of Bath
Feras AlkhalilPragmatIC Printing LLC

Films

Plasma NiOx

Hardware used: Beneq TFS-200
Bis(cyclopentadienyl)nickel, Nickelocene, Cp2Ni
CAS#: 1271-28-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 75-325C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Stokes LSE Ellipsometer

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Advance

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Advance

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific ESCA LAB 250 XPS Spectrometer

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Diagnostic: Renishaw Invia Raman

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instruments Nanoscope 3A

Characteristic: Band Gap
Analysis: UV-VIS Spectroscopy
Diagnostic: -

Characteristic: Uniformity
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-6320F

Substrates

SiO2
TiO2

Notes

1518