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The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges

Type:
Journal
Info:
J. Phys. D: Appl. Phys. 50 095201
Date:
2017-01-16
DOI:
http://dx.doi.org/10.1088/1361-6463/aa59b3

Author Information

Name Institution
Mari NapariUniversity of Jyväskylä
O. TarvainenUniversity of Jyväskylä
Sami KinnunenUniversity of Jyväskylä
Kai ArstilaUniversity of Jyväskylä
Jaakko JulinUniversity of Jyväskylä
Ø. S. FjellvågUniversity of Oslo
K. WeibyeUniversity of Oslo
O. NilsenUniversity of Oslo
Timo SajavaaraUniversity of Jyväskylä

Films

Plasma ZnO

Hardware used: Beneq TFS-200
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 50C

Plasma TiO2

Hardware used: Beneq TFS-200
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Rudolf AutoEL III

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Diagnostic: PANalytical Empyrean

Characteristic: Morphology, Roughness, Topography
Analysis: HIM, Helium Ion Microscopy
Diagnostic: Zeiss Orion NanoFab

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Ocean Optics USB 2000

Substrates

Si with native oxide

Notes

1402