| 1 | Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4 |
| 2 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
| 3 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 4 | Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films |
| 5 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 6 | Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition |
| 7 | Atomic layer deposition of TiN for the fabrication of nanomechanical resonators |
| 8 | Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy |
| 9 | Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics |
| 10 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
| 11 | Protective capping and surface passivation of III-V nanowires by atomic layer deposition |
| 12 | Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications |
| 13 | Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization |
| 14 | Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity |
| 15 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 16 | Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories |
| 17 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |
| 18 | Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition |
| 19 | Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor |
| 20 | Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications |
| 21 | Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells |
| 22 | Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films |
| 23 | Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals |
| 24 | In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition |
| 25 | TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition |
| 26 | Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry |
| 27 | Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor |
| 28 | Fabrication and deformation of three-dimensional hollow ceramic nanostructures |
| 29 | Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition |
| 30 | TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD |
| 31 | Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride |
| 32 | Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films |
| 33 | Silicon nanowire networks for multi-stage thermoelectric modules |
| 34 | Breakdown and Protection of ALD Moisture Barrier Thin Films |
| 35 | Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition |
| 36 | Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating |
| 37 | Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN |
| 38 | Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition |
| 39 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 40 | High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films |
| 41 | Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition |
| 42 | Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification |
| 43 | NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors |
| 44 | Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition |
| 45 | In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential |
| 46 | Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration |
| 47 | Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films |
| 48 | Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition |
| 49 | Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma |
| 50 | Fundamental beam studies of radical enhanced atomic layer deposition of TiN |
| 51 | Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity |
| 52 | Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications |
| 53 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 54 | Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System |
| 55 | Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition |
| 56 | Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films |
| 57 | Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode |
| 58 | Tribological properties of thin films made by atomic layer deposition sliding against silicon |
| 59 | Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors |
| 60 | Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition |
| 61 | Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si |
| 62 | Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy |
| 63 | The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges |
| 64 | Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support |
| 65 | Film Uniformity in Atomic Layer Deposition |
| 66 | Microwave properties of superconducting atomic-layer deposited TiN films |
| 67 | Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition |
| 68 | New materials for memristive switching |
| 69 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 70 | Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System |
| 71 | Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition |
| 72 | Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal |
| 73 | Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance |
| 74 | Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers |
| 75 | Nitride memristors |
| 76 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma |
| 77 | Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes |
| 78 | Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks |
| 79 | Protective capping and surface passivation of III-V nanowires by atomic layer deposition |
