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TiCl4, Titanium Tetrachloride, CAS# 7550-45-0

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 79 record(s).

NumberTitle
1Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films
2Atomic Layer Deposition (ALD) grown thin films for ultra-fine pitch pixel detectors
3NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors
4Ferroelectric properties of full plasma-enhanced ALD TiN/La:HfO2/TiN stacks
5Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
6Relationships among growth mechanism, structure and morphology of PEALD TiO2 films: the influence of O2 plasma power, precursor chemistry and plasma exposure mode
7Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
8TiCl4 as a Precursor in the TiN Deposition by ALD and PEALD
9Microwave properties of superconducting atomic-layer deposited TiN films
10Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
11Synaptic Plasticity and Learning Behaviors Mimicked in Single Inorganic Synapses of Pt/HfOx/ZnOx/TiN Memristive System
12Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
13Efficient Catalytic Microreactors with Atomic-Layer-Deposited Platinum Nanoparticles on Oxide Support
14Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity
15Fabrication and deformation of three-dimensional hollow ceramic nanostructures
16Silicon nanowire networks for multi-stage thermoelectric modules
17Temperature control for the gate workfunction engineering of TiC film by atomic layer deposition
18Antioxidation properties of Ti0.83Al0.17N prepared using plasma-enhanced atomic layer deposition
19Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
20Synthesis and characterization of titanium silicon oxide thin films prepared by plasma enhanced atomic layer deposition
21Breakdown and Protection of ALD Moisture Barrier Thin Films
22Excellent resistive switching properties of atomic layer-deposited Al2O3/HfO2/Al2O3 trilayer structures for non-volatile memory applications
23Optical emission spectroscopy as a tool for studying, optimizing, and monitoring plasma-assisted atomic layer deposition processes
24Enhancing the Wettability of High Aspect-Ratio Through-Silicon Vias Lined With LPCVD Silicon Nitride or PE-ALD Titanium Nitride for Void-Free Bottom-Up Copper Electroplating
25Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4 , SiH4, and N2/H2/Ar Plasma
26Growth kinetics and initial stage growth during plasma-enhanced Ti atomic layer deposition
27Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition
28Plasma-assisted atomic layer deposition of TiN monitored by in situ spectroscopic ellipsometry
29In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential
30TiN/AlN Nano Multilayers Film Fabricated by Plasma Enhanced Atomic Layer Deposition
31Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
32Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma
33Plasma-Enhanced Atomic Layer Deposition of Anatase TiO2 Using TiCl4
34Hot-Wire Generated Atomic Hydrogen and its Impact on Thermal ALD in TiCl4/NH3 System
35Reliability testing of high aspect ratio through silicon vias fabricated with atomic layer deposition barrier, seed layer and direct plating and material properties characterization of electrografted insulator, barrier and seed layer for 3-D integration
36Protective capping and surface passivation of III-V nanowires by atomic layer deposition
37Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
38Tribological properties of thin films made by atomic layer deposition sliding against silicon
39Conformal Formation of (GeTe2)(1-x)(Sb2Te3)x Layers by Atomic Layer Deposition for Nanoscale Phase Change Memories
40Plasma Enhanced Atomic Layer Deposition of Al2O3 and TiN
41Comparison of chemical stability and corrosion resistance of group IV metal oxide films formed by thermal and plasma-enhanced atomic layer deposition
42The α and γ plasma modes in plasma-enhanced atomic layer deposition with O2-N2 capacitive discharges
43Bipolar Resistive Switching Characteristics of HfO2/TiO2/HfO2 Trilayer-Structure RRAM Devices on Pt and TiN-Coated Substrates Fabricated by Atomic Layer Deposition
44Residual chlorine in TiO2 films grown at low temperatures by plasma enhanced atomic layer deposition
45Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
46Electron Transport Across Ultrathin Ferroelectric Hf0.5Zr0.5O2 Films on Si
47Strongly Disordered TiN and NbTiN s-Wave Superconductors Probed by Microwave Electrodynamics
48Preparation of Lithium Containing Oxides by the Solid State Reaction of Atomic Layer Deposited Thin Films
49Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
50Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
51Radical Enhanced Atomic Layer Deposition of Metals and Oxides
52Fundamental beam studies of radical enhanced atomic layer deposition of TiN
53Titanium Oxynitride Interlayer to Influence Oxygen Reduction Reaction Activity and Corrosion Stability of Pt and Pt-Ni Alloy
54Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
55Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications
56Band alignment of atomic layer deposited TiO2/multilayer MoS2 interface determined by x-ray photoelectron spectroscopy
57Tribological properties of thin films made by atomic layer deposition sliding against silicon
58Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition
59Film Uniformity in Atomic Layer Deposition
60Investigating the TiN film quality and growth behavior for plasma-enhanced atomic layer deposition using TiCl4 and N2/H2/Ar radicals
61Atomic layer deposition of TiN for the fabrication of nanomechanical resonators
62Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
63In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition
64Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization
65Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance
66Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
67Nitride memristors
68Evaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
69High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
70Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition
71Protective capping and surface passivation of III-V nanowires by atomic layer deposition
72Plasma-assisted atomic layer deposition of TiN/Al2O3 stacks for metal-oxide-semiconductor capacitor applications
73Investigation of residual chlorine in TiO2 films grown by Atomic Layer Deposition
74Optimization of Plasma Enhanced Atomic Layer Deposition Processes for Oxides, Nitrides and Metals in the Oxford Instruments FlexAL Reactor
75Deposition of TiN and HfO2 in a commercial 200 mm remote plasma atomic layer deposition reactor
76Tribological properties of thin films made by atomic layer deposition sliding against silicon
77Low Resistive Edge Contacts to CVD-Grown Graphene Using a CMOS Compatible Metal
78Growth mechanism and diffusion barrier property of plasma-enhanced atomic layer deposition Ti-Si-N thin films
79New materials for memristive switching