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NiCO2O4@TiN Core-shell Electrodes through Conformal Atomic Layer Deposition for All-solid-state Supercapacitors

Type:
Journal
Info:
Electrochimica Acta Volume 196, 2016, Pages 611 - 621
Date:
2016-03-16
DOI:
http://dx.doi.org/10.1016/j.electacta.2016.03.015

Author Information

Name Institution
Ruiqi WangKing Abdullah University of Science and Technology
Chuan XiaKing Abdullah University of Science and Technology
Nini WeiKing Abdullah University of Science and Technology
Husam N. AlshareefKing Abdullah University of Science and Technology

Films

Plasma TiN

Hardware used: Oxford Instruments FlexAL
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
NH3, Ammonia
CAS#: 7664-41-7
Deposition Temperature = 350C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: FEI Nova NanoSEM 630

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Titan S 80-300 TEM/STEM

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Advance

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Diagnostic: FEI Titan S 80-300 TEM/STEM

Characteristic: Electrochemical Performance
Analysis: CV, Cyclic Voltammetry
Diagnostic: Bio-Logic VMP3 multichannel electrochemical workstation

Substrates

NiCo2O4

Notes

805