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Fabrication and deformation of three-dimensional hollow ceramic nanostructures

Type:
Journal
Info:
Nature Materials vol. 12, no. 10, pp. 893 - 898, 2013.
Date:
2013-07-17
DOI:
http://dx.doi.org/10.1038/nmat3738

Author Information

Name Institution
Dongchan JangCalifornia Institute of Technology
Lucas R. MezaCalifornia Institute of Technology
Frank GreerJet Propulsion Laboratory
Julia R. GreerCalifornia Institute of Technology

Films

Plasma TiN

Hardware used: Oxford Instruments OpAL
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 140C

Film/Plasma Properties

Characteristic: Mechanical Properties
Analysis: Compression Testing
Diagnostic: -

Substrates

Photoresist

Notes

596