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Atomic layer deposition of epitaxial layers of anatase on strontium titanate single crystals: Morphological and photoelectrochemical characterization

Type:
Journal
Info:
J. Vac. Sci. Technol. A 33(1), Jan/Feb 2015
Date:
2014-11-11
DOI:
http://dx.doi.org/10.1116/1.4902328

Author Information

Name Institution
Theodore J. KrausUniversity of Wyoming
Alexander B. NepomnyashchiiUniversity of Wyoming
B. A. ParkinsonUniversity of Wyoming

Films

Thermal TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Asylum Research

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Filmetrics

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Rigaku

Characteristic: Photocurrent
Analysis: Photocurrent Measurements
Diagnostic: Custom

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Substrates

SrTiO3
Silicon

Notes

Ultratech Fiji epitaxial thermal ALD study of anatase TiO2 on SrTiO3.
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