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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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Silicon nanowire lithium-ion battery anodes with ALD deposited TiN coatings demonstrate a major improvement in cycling performance

Type:
Journal
Info:
J. Mater. Chem. A, 2013, 1, 12850-12861
Date:
2013-09-06
DOI:
http://dx.doi.org/10.1039/C3TA12964K

Author Information

Name Institution
Alireza KohandehghanUniversity of Alberta
Peter KalisvaartUniversity of Alberta
Kai CuiNational Institute for Nanotechnology, Alberta, Canada
Martin KupstaNational Institute for Nanotechnology, Alberta, Canada
Elmira MemarzadehUniversity of Alberta
David MitlinUniversity of Alberta

Films

Plasma TiN

Hardware used: Oxford Instruments FlexAL
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: ELS, EELS, Electron Energy Loss Spectroscopy
Diagnostic: JEOL 2200FS

Characteristic: Unknown
Analysis: FIB, Focused Ion Beam
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Substrates

Silicon

Notes

615