Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Electrodynamic response and local tunneling spectroscopy of strongly disordered superconducting TiN films

Type:
Journal
Info:
Phys. Rev. B 88, 180505, 2013
Date:
2013-10-10
DOI:
http://dx.doi.org/10.1103/PhysRevB.88.180505

Author Information

Name Institution
P. C. J. J. CoumouDelft University of Technology
E. F. C. DriessenCEA - INAC
J. BuenoSRON National Institute for Space Research
C. ChapelierCEA - INAC
T. M. KlapwijkDelft University of Technology

Films

Plasma TiN

Hardware used: Unknown
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Bar Structures
Diagnostic: -

Characteristic: Superconductivity
Analysis: -
Diagnostic: -

Substrates

Si(100)

Notes

Paper available as chapter 6 in on-line thesis.
679