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High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 30, 021502 (2012)
Date:
2011-12-30
DOI:
http://dx.doi.org/10.1116/1.3678486

Author Information

Name Institution
Eric DickeyLotus Applied Technology
William A. BarrowLotus Applied Technology

Films

Plasma TiO2

Hardware used: Custom
TiCl4, Titanium Tetrachloride
CAS#: 7550-45-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma Al2O3

Hardware used: Custom
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: -
Diagnostic: -

Substrates

PET, Polyethylene Terephthalate

Notes

649