Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings

Type:
Journal
Info:
Nanomaterials 2017, 7, 193
Date:
2017-07-20

Author Information

Name Institution
Aleksandra RadtkeNicolaus Copernicus University in Toruń
Tomasz JędrzejewskiNicolaus Copernicus University in Toruń
Wiesław KozakNicolaus Copernicus University in Toruń
Beata SadowskaUniversity of Lodz
Marzena Więckowska-SzakielUniversity of Lodz
Ewa TalikUniversity of Silesia
Maarit MäkeläUniversity of Helsinki
Markku A. LeskeläUniversity of Helsinki
Piotr PiszczekNicolaus Copernicus University in Toruń

Films


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Substrates

TiO2

Notes

1110