About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Prevention of spontaneous combustion of cellulose with a thin protective Al2O3 coating formed by atomic layer deposition

Type:
Journal
Info:
Surface & Coatings Technology 333 (2018) 81 - 86
Date:
2017-10-24

Author Information

Name Institution
Ales OmerzuUniversity of Rijeka
Iva SaricUniversity of Rijeka
Ivna Kavre PiltaverUniversity of Rijeka
Mladen PetravicUniversity of Rijeka
Tea KapunPulp and Paper Institute
Janja ZulePulp and Paper Institute
Sanja StifterUniversity of Rijeka
Kresimir SalamonRudjer Boskovic Institute

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Cotton
Paper
Wood

Notes

1125