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Spoof-like plasmonic behavior of plasma enhanced atomic layer deposition grown Ag thin films

Type:
Journal
Info:
APPLIED PHYSICS LETTERS 100, 053106 (2012)
Date:
2011-12-28
DOI:
http://dx.doi.org/10.1063/1.3679106

Author Information

Name Institution
Sharka M. ProkesU.S. Naval Research Laboratory
Orest J. GlembockiU.S. Naval Research Laboratory
Erin ClevelandU.S. Naval Research Laboratory
Joshua D. CaldwellU.S. Naval Research Laboratory
Edward FoosU.S. Naval Research Laboratory
Jaakko T. NiinistöUniversity of Helsinki
Mikko K. RitalaUniversity of Helsinki

Films

Plasma Ag

Hardware used: Beneq TFS-200
Ag(FOD)(PEt3), Triethylphosphine (6,6,7,7,8,8,8- heptafluoro-2,2- dimethyl-3,5- octanedionate) silver(I)
CAS#: 165461-74-5
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 125C

Film/Plasma Properties

Characteristic: Thickness
Analysis: n,k Spectrometry
Diagnostic: -

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Leica Cambridge Stereoscan 360FE

Characteristic: SERS
Analysis: SERS, Surface Enhanced Raman Scattering
Diagnostic: Custom

Characteristic: SERS
Analysis: SERS, Surface Enhanced Raman Scattering
Diagnostic: DeltaNu Reporter 785

Substrates

Si(100)

Notes

Beneq TFS-200 PEALD Ag thin film plasmonic behavior study.
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