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Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

Type:

Journal

Info:

Journal of Power Sources 497 (2021) 229866

Date:

2021-03-27

DOI:

https://doi.org/10.1016/j.jpowsour.2021.229866

Author Information

Name	Institution
Lowie Henderick	Ghent University
Ahmed Hamed	Hasselt University
Felix Mattelaer	Ghent University
Matthias M. Minjauw	Ghent University
Mikko Nisula	Ghent University
Johan Meersschaut	IMEC
Jolien Dendooven	Ghent University
Mohammadhosein Safari	Hasselt University
Philippe M Vereecken	IMEC
Christophe Detavernier	Ghent University

Films

Plasma TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

Trimethyl phosphate, TMP, (MeO)₃PO

CAS#: 512-56-1

CAS#: 7782-44-7

Deposition Temperature = 300C

Plasma TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

Trimethyl phosphate, TMP, (MeO)₃PO

CAS#: 512-56-1

CAS#: 7782-44-7

CAS#: 7727-37-9

Deposition Temperature = 300C

Plasma N:TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

Trimethyl phosphate, TMP, (MeO)₃PO

CAS#: 512-56-1

CAS#: 7782-44-7

CAS#: 7727-37-9

Deposition Temperature = 300C

Plasma N:TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

Trimethyl phosphate, TMP, (MeO)₃PO

CAS#: 512-56-1

CAS#: 7727-37-9

Deposition Temperature = 300C

Plasma TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

DEPA, diethylphosphoramidate

CAS#: 1068-21-9

CAS#: 7782-44-7

Deposition Temperature = 300C

Plasma N:TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

DEPA, diethylphosphoramidate

CAS#: 1068-21-9

CAS#: 7782-44-7

CAS#: 7727-37-9

Deposition Temperature = 300C

Plasma TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

DEPA, diethylphosphoramidate

CAS#: 1068-21-9

CAS#: 7782-44-7

CAS#: 7727-37-9

Deposition Temperature = 300C

Plasma N:TiP₂O₇

Hardware used: Custom Remote Inductively Coupled Plasma

TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)₄

CAS#: 546-68-9

DEPA, diethylphosphoramidate

CAS#: 1068-21-9

CAS#: 7727-37-9

Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness

Analysis: Ellipsometry

Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness

Analysis: XRR, X-Ray Reflectivity

Diagnostic: Bruker D8 Advance

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure

Analysis: XRD, X-Ray Diffraction

Diagnostic: Bruker D8 Advance

Characteristic: Chemical Composition, Impurities

Analysis: XPS, X-ray Photoelectron Spectroscopy

Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Chemical Composition, Impurities

Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Diagnostic: -

Characteristic: Electrochemical Performance

Analysis: Electrochemical Analysis

Diagnostic: -

Substrates

Si(100)

Notes

Nice TMP and DEPA decomposition data
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