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Highly reflective polymeric substrates functionalized utilizing atomic layer deposition

Type:
Journal
Info:
Applied Physics Letters 107, 061602 (2015)
Date:
2015-07-28
DOI:
http://dx.doi.org/10.1063/1.4928375

Author Information

Name Institution
Ana ZuzuarreguiCIC Nanogune Consolider
Borja CotoIK4-Tekniker
Jorge RodríguezTorresol Energy (SENER Group)
Keith E. GregorczykCIC Nanogune Consolider
Unai Ruiz de GopeguiIK4-Tekniker
Javier BarrigaIK4-Tekniker
Mato KnezCIC Nanogune Consolider

Films

Other TiO2

Hardware used: Unknown
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Hydrogen Peroxide, H2O2
CAS#: 7722-84-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Images
Analysis: Optical Microscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Hardness
Analysis: Nanoindentation
Diagnostic: -

Substrates

PTFE

Notes

Examined O2 plasma pretreatement of Teflon prior to thermal ALD TiO2 process.
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