Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Simple plasma assisted atomic layer deposition technique for high substitutional nitrogen doping of TiO2

Type:
Journal
Info:
Journal of Vacuum Science & Technology A 36, 031602 (2018)
Date:
2018-02-18
DOI:
http://dx.doi.org/10.1116/1.5019170

Author Information

Name Institution
Abdullah H. AlshehriUniversity of Waterloo
Nathan Nelson-FitzpatrickUniversity of Waterloo
Khaled H. IbrahimUniversity of Waterloo
Kissan MistryUniversity of Waterloo
Mustafa YavuzUniversity of Waterloo
Kevin P. MusselmanUniversity of Waterloo

Films

Plasma TiON

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 250C

Plasma TiO2

Hardware used: Oxford Instruments FlexAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Reflectance Spectra
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Extinction Coefficient
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Optical Properties
Analysis: UV-VIS Spectroscopy
Diagnostic: Shimadzu UV-2501

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000DI

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 250

Substrates

Si(100)
Glass

Notes

1547