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The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films

Type:
Journal
Info:
Surface & Coatings Technology 324 (2017) 243-248
Date:
2017-05-29
DOI:
https://doi.org/10.1016/j.surfcoat.2017.05.085

Author Information

Name Institution
Yunfei WangAjou University
Andre RicardUniversité de Toulouse
Jean-Philippe SarretteUniversité de Toulouse
Ansoon KimKorea Research Institute of Standards and Science (KRISS)
Yu Kwon KimAjou University

Films

Thermal TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 220C

Other TiON

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 220C

Other TiON

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
N2, Nitrogen
CAS#: 7727-37-9
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 220C

Film/Plasma Properties

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Diagnostic: Monera 500 Spectrometer

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: PHI VersaProbe 5000

Substrates

Si(111)

Notes

1651