About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

Flexible Memristive Memory Array on Plastic Substrates

Type:
Journal
Info:
Nano Lett., 2011, 11 (12), pp 5438-5442
Date:
2011-10-23

Author Information

Name Institution
Seungjun KimKorea Advanced Institute of Science and Technology
Hu Young JeongKorea Advanced Institute of Science and Technology
Sung Kyu KimKorea Advanced Institute of Science and Technology
Sung-Yool ChoiElectronics and Telecommunication Research Institute, (ETRI)
Keon Jae LeeKorea Advanced Institute of Science and Technology

Films

Plasma TiO2


Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Resistive Switching
Analysis: I-V, Current-Voltage Measurements

Substrates

Polyimide

Notes

1013