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ASM Genitech PEALD Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using ASM Genitech PEALD hardware returned 20 records.

NumberTitle
1Influence of oxidant source on the property of atomic layer deposited Al2O3 on hydrogen-terminated Si substrate
2Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
3Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma
4Electrical properties of Ga2O3-based dielectric thin films prepared by plasma enhanced atomic layer deposition (PEALD)
5Microscopic origin of bipolar resistive switching of nanoscale titanium oxide thin films
6Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
7Growth Temperature Dependence of TiO2 Thin Films Prepared by Using Plasma-Enhanced Atomic Layer Deposition Method
8Growth behavior and film properties of titanium dioxide by plasma-enhanced atomic layer deposition with discrete feeding method
9The Formation of an Almost Full Atomic Monolayer via Surface Modification by N2O-Plasma in Atomic Layer Deposition of ZrO2 Thin Films
10Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
11Characteristics of ZnO Thin Films by Means of Plasma-Enhanced Atomic Layer Deposition
12Formation of Ru nanocrystals by plasma enhanced atomic layer deposition for nonvolatile memory applications
13A low-temperature-grown TiO2 -based device for the flexible stacked RRAM application
14Flexible Memristive Memory Array on Plastic Substrates
15Effect of plasma and heat treatment on silicon dioxide films by plasma-enhanced atomic layer deposition
16Plasma-enhanced atomic layer deposition of low temperature silicon dioxide films using di-isopropylaminosilane as a precursor
17Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O2 Reactants
18Atomic Layer Deposition of Ru Nanocrystals with a Tunable Density and Size for Charge Storage Memory Device Application
19Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
20Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas