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Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Applied Physics Letters 85, 4896-4898 (2004)
Date:
2004-10-07

Author Information

Name Institution
Sun Jin YunElectronics and Telecommunication Research Institute, (ETRI)
Young-Wook KoElectronics and Telecommunication Research Institute, (ETRI)
Jung Wook LimElectronics and Telecommunication Research Institute, (ETRI)

Films

Plasma AlON


Film/Plasma Properties

Characteristic: Passivation
Analysis: Custom

Characteristic: Etch Rate
Analysis: Wet Etch

Substrates

OLED

Notes

1473