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AlON Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing AlON films returned 14 record(s).

Number	Title
1	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
2	Improved Electrical Properties of Crystalline ZrO₂/Al₂O₃ Buffer Gate Stack with Double Nitridation
3	Thin effective oxide thickness (~0.5 nm) and low leakage current gate dielectric for Ge MOS devices by plasma nitrided Al₂O₃ intermediate layer
4	Oxide Charge Engineering of Atomic Layer Deposited AlO_xN_y/Al₂O₃ Gate Dielectrics: A Path to Enhancement Mode GaN Devices
5	Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
6	Improved stability of electrical properties of nitrogen-added Al₂O₃ films grown by PEALD as gate dielectric
7	Interface engineering of an AlNO/AlGaN/GaN MIS diode induced by PEALD alternate insertion of AlN in Al₂O₃
8	Effects of Recessed-Gate Structure on AlGaN/GaN-on-SiC MIS-HEMTs with Thin AlO_xN_y MIS Gate
9	Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
10	Stabilization of Al₂O₃ gate oxide on plastic substrate for low temperature poly-silicon by in situ plasma treatment
11	Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
12	Plasma nitridation of atomic layer deposition (ALD) Al₂O₃ by NH₃ in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
13	Plasma-assisted atomic layer deposition of Al₂O₃ moisture permeation barriers on polymers
14	Effect of Buffer Layer for HfO₂ Gate Dielectrics Grown by Remote Plasma Atomic Layer Deposition