Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks
Info:
ECS J. Solid State Sci. Technol. 2013 volume 2, issue 12, P524-P528
Author Information
Films
Film/Plasma Properties
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: I-V, Current-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: TEM, Transmission Electron Microscope
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
Notes