Li-Tien Huang Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Li-Tien Huang returned 5 record(s).

Number	Title
1	Enhancement of Electrical Characteristics and Reliability in Crystallized ZrO2 Gate Dielectrics Treated with In-Situ Atomic Layer Doping of Nitrogen
2	Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectrics
3	Improvement in electrical characteristics of HfO2 gate dielectrics treated by remote NH3 plasma
4	Effect of hydrogen participation on the improvement in electrical characteristics of HfO2 gate dielectrics by post-deposition remote N2 , N2/H2, and NH3 plasma treatments
5	Improvement of Capacitance Equivalent Thickness, Leakage Current, and Interfacial State Density Based on Crystallized High-K Dielectrics/Nitrided Buffer Layer Gate Stacks