Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Sun Jin Yun Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Sun Jin Yun returned 15 record(s).

NumberTitle
1PEALD of Zirconium Oxide Using Tetrakis(ethylmethylamino)zirconium and Oxygen
2Optical and Electrical Properties of AlxTi1-xO Films
3Pentacene-Thin Film Transistors with ZrO2 Gate Dielectric Layers Deposited by Plasma-Enhanced Atomic Layer Deposition
4Electrical Properties of Alumina Films by Plasma-Enhanced Atomic Layer Deposition
5Effect of Plasma on Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition
6Characteristics of Aluminum Silicate Films Grown by Plasma-Enhanced Atomic Layer Deposition
7Optical and Electrical Properties of TixSi1-xOy Films
8Investigation of a Two-Layer Gate Insulator Using Plasma-Enhanced ALD for Ultralow Temperature Poly-Si TFTs
9Passivation of organic light-emitting diodes with aluminum oxide thin films grown by plasma-enhanced atomic layer deposition
10Improved stability of electrical properties of nitrogen-added Al2O3 films grown by PEALD as gate dielectric
11Characteristics of TiO2 Films Prepared by ALD With and Without Plasma
12Electrical Properties of Aluminum Silicate Films Grown by Plasma Enhanced Atomic Layer Deposition
13Characteristics of AlxTi1-xOy Films Grown by Plasma-Enhanced Atomic Layer Deposition
14Characterization of AlON-TiON Stacked Insulators For ZnS:Mn Thin Film Electroluminescent Devices
15Low-Temperature Growth of SiO2 Films by Plasma-Enhanced Atomic Layer Deposition