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Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications

Type:
Conference Proceedings
Info:
2015 6th IEEE International Workshop on Advances in Sensors and Interfaces (IWASI)
Date:
2015-06-18
DOI:
http://dx.doi.org/10.1109/IWASI.2015.7184978

Author Information

Name Institution
S. SchroderTechnische Universität Berlin
O. DoganTechnische Universität Berlin
Jessica SchneidewindSentech Instruments GmbH
G. BertottiTechnische Universität Berlin
S. KeilTechnische Universität Berlin
Hassan GargouriSentech Instruments GmbH
Michael ArensSentech Instruments GmbH
E. BroseTechnische Universität Berlin
J. BrunsTechnische Universität Berlin
D. WolanskyTechnische Universität Berlin
B. TillackTechnische Universität Berlin
S. VassanelliTechnische Universität Berlin
B. SzyszkaTechnische Universität Berlin
R. ThewesTechnische Universität Berlin

Films

Plasma TiO2

Hardware used: SENTECH
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
H2O, Water
CAS#: 7732-18-5
Deposition Temperature = 270C

Film/Plasma Properties

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Diagnostic: Agilent B1500A Semiconductor Device Analyzer

Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: Agilent B1500A Semiconductor Device Analyzer

Substrates

Notes

546