Hassan Gargouri Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Hassan Gargouri returned 18 record(s).

Number	Title
1	Analysis of nitrogen species in titanium oxynitride ALD films
2	Use of B₂O₃ films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon
3	Atmospheric pressure plasma enhanced spatial atomic layer deposition of SnO_x as conductive gas diffusion barrier
4	Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
5	Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
6	Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al₂O₃-films
7	Capacitance and conductance versus voltage characterization of Al₂O₃ layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
8	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
9	In situ real-time and ex situ spectroscopic analysis of Al₂O₃ films prepared by plasma enhanced atomic layer deposition
10	Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
11	Three dimensional ALD of TiO₂ for in-vivo biomedical sensor applications
12	Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13	Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
14	Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
15	Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
16	In-gap states in titanium dioxide and oxynitride atomic layer deposited films
17	Atomic Layer Deposition of Al₂O₃ Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
18	Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition