Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 35, 01B117 (2017)
Date:
2016-11-16
Author Information
| Name | Institution |
|---|---|
| Sebastian Franke | Technische Universität Braunschweig |
| Matthias Baumkötter | Technische Universität Braunschweig |
| Carsten Monka | Technische Universität Braunschweig |
| Sebastian Raabe | Technische Universität Braunschweig |
| Reinhard Caspary | Technische Universität Braunschweig |
| Hans-Hermann Johannes | Technische Universität Braunschweig |
| Wolfgang Kowalsky | Technische Universität Braunschweig |
| Sebastian Beck | University of Heidelberg |
| Annemarie Pucci | University of Heidelberg |
| Hassan Gargouri | Sentech Instruments GmbH |
Films
Thermal Al2O3
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy
Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Substrates
| Si(100) |
Notes
| 839 |