He, Helium, CAS# 7440-59-7

Your search for publications using this chemistry returned 11 record(s).

Number	Title
1	A PEALD Tunnel Dielectric for Three-Dimensional Non-Volatile Charge-Trapping Technology
2	Working gas effect on properties of Al₂O₃ film in plasma-enhanced atomic layer deposition
3	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
4	Atomic Layer Densification of AlN Passivation Layer on Epitaxial Ge for Enhancement of Reliability and Electrical Performance of High-K Gate Stacks
5	Si atomic layer epitaxy based on Si₂H₆ and remote He plasma bombardment
6	Ta-rich atomic layer deposition TaN adhesion layer for Cu interconnects by means of plasma-enhanced atomic layer deposition
7	Alumina films as gas barrier layers grown by spatial atomic layer deposition with trimethylaluminum and different oxygen sources
8	Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices
9	AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
10	Band alignment of zinc oxide as a channel layer in a gate stack structure grown by plasma enhanced atomic layer deposition
11	Low temperature growth of high-k Hf-La oxides by remote-plasma atomic layer deposition: Morphology, stoichiometry, and dielectric properties