About Plasma ALD, LLC

The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

Our ICP sources are designed for integration with existing ALD and vacuum-processing equipment. Plasma ALD also provides plasma-source integration, process-development, and troubleshooting assistance based on decades of experience with low-pressure plasma processing and PEALD systems.

Researchers, universities, equipment manufacturers, and laboratories looking for an ICP plasma source or assistance adding plasma capability to a vacuum system can learn more on our Plasma Sources page.

SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records.

NumberTitle
1Optical display film as flexible and light trapping substrate for organic photovoltaics
2In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
3Advances in the fabrication of graphene transistors on flexible substrates
4Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
5Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
6Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
7Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
8Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
9Crystalline growth of AlN thin films by atomic layer deposition
10Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
11Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
12Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
13Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
14Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
15Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
16Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
17Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
18Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
19In-gap states in titanium dioxide and oxynitride atomic layer deposited films
20Comparative study of ALD SiO2 thin films for optical applications
21Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition
22Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
23Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
24Breakdown and Protection of ALD Moisture Barrier Thin Films
25Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
26Flexible, light trapping substrates for organic photovoltaics
27Analysis of nitrogen species in titanium oxynitride ALD films
28Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
29Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
30Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition