Inductively coupled plasma sources from Plasma ALD, LLC.


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SENTECH Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications using SENTECH hardware returned 30 records.

NumberTitle
1Localized defect states and charge trapping in atomic layer deposited-Al2O3 films
2Comparison of plasma-enhanced atomic layer deposition AlN films prepared with different plasma sources
3Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
4Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices
5Plasma-enhanced atomic layer deposition of titanium oxynitrides films: A comparative spectroscopic and electrical study
6In situ real-time and ex situ spectroscopic analysis of Al2O3 films prepared by plasma enhanced atomic layer deposition
7Analysis of nitrogen species in titanium oxynitride ALD films
8Ellipsometry and XPS comparative studies of thermal and plasma enhanced atomic layer deposited Al2O3-films
9Flexible, light trapping substrates for organic photovoltaics
10Organic narrowband near-infrared photodetectors based on intermolecular charge-transfer absorption
11Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25°C<T<200°C
12Comparative study of ALD SiO2 thin films for optical applications
13In-gap states in titanium dioxide and oxynitride atomic layer deposited films
14Breakdown and Protection of ALD Moisture Barrier Thin Films
15Optical display film as flexible and light trapping substrate for organic photovoltaics
16Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
17Structural and electrical properties of AlN thin films on GaN substrates grown by plasma enhanced-Atomic Layer Deposition
18Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
19Advances in the fabrication of graphene transistors on flexible substrates
20Atomic Layer Deposition of Al2O3 Thin Films for Metal Insulator Semiconductor Applications on 4H-SiC
21Crystalline growth of AlN thin films by atomic layer deposition
22Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor
23Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon
24Negative charge trapping effects in Al2O3 films grown by atomic layer deposition onto thermally oxidized 4H-SiC
25Laminated Al2O3-HfO2 layers grown by atomic layer deposition for microelectronics applications
26Thermal and plasma enhanced atomic layer deposition of TiO2: Comparison of spectroscopic and electric properties
27Plasma enhanced atomic layer deposition of Al2O3 gate dielectric thin films on AlGaN/GaN substrates: The role of surface predeposition treatments
28Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications
29Ag films grown by remote plasma enhanced atomic layer deposition on different substrates
30Analysis of titanium species in titanium oxynitride films prepared by plasma enhanced atomic layer deposition