Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Plasma enhanced atomic layer deposition of SrTiO3 thin films with Sr(tmhd)2 and Ti(i-OPr)4

Type:
Journal
Info:
J. Vac. Sci. Technol. A 20(5), Sep/Oct 2002
Date:
2002-06-17
DOI:
http://dx.doi.org/10.1116/1.1500745

Author Information

Name Institution
J. H. LeeSamsung Electronics Co.
Young Joon ChoSamsung Electronics Co.
Y. S. MinSamsung Electronics Co.
D. KimSamsung Electronics Co.
Shi-Woo RheePohang University of Science and Technology (POSTECH)

Films

Plasma SrTiO3

Hardware used: Custom
Sr(DPM)2, Strontium(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate)
CAS#: 36830-74-7
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma SrO

Hardware used: Custom
Sr(DPM)2, Strontium(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate)
CAS#: 36830-74-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry
Diagnostic: -

Characteristic: Conformality, Step Coverage
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: -
Diagnostic: -

Characteristic: EOT, Equivalent Oxide Thickness
Analysis: -
Diagnostic: -

Characteristic: Leakage Current
Analysis: -
Diagnostic: -

Substrates

Ru

Notes

Precursors dissolved in THF.
Cycle was Sr and Ti pulsed together/Ar purge/O2 plasma/Ar purge.
125