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Low-Temperature ALD Growth of SrTiO3 Thin Films from Sr beta-Diketonates and Ti Alkoxide Precursors Using Oxygen Remote Plasma as an Oxidation Source

Type:
Journal
Info:
Chem. Vap. Deposition 2002, 8, No. 5, p. 195-197
Date:
2002-04-29
DOI:
http://dx.doi.org/10.1002/1521-3862(20020903)8:5<195::AID-CVDE195>3.0.CO;2-9

Author Information

Name Institution
Deok-Sin KilHynix Semiconductor
Jong-Min LeeHynix Semiconductor
Jae-Sung RohHynix Semiconductor

Films

Plasma SrO

Hardware used: Custom
bis[1-(2-methoxyethoxy)-2,2,6,6-tetramethyl-3,5-heptanedionate], Sr(METHD)2
CAS#: 0-0-0
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma TiO2

Hardware used: Custom
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma SrTiO3

Hardware used: Custom
bis[1-(2-methoxyethoxy)-2,2,6,6-tetramethyl-3,5-heptanedionate], Sr(METHD)2
CAS#: 0-0-0
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Thermal SrO

Hardware used: Custom
bis[1-(2-methoxyethoxy)-2,2,6,6-tetramethyl-3,5-heptanedionate], Sr(METHD)2
CAS#: 0-0-0
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Substrates

Si(100)

Notes

Sr precursor 0.07M in menthanol with liquid delivery.
Astron Astex remote plasma generator.
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