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Increment of dielectric properties of SrTiO3 thin films by SrO interlayer on Ru bottom electrodes

Type:
Journal
Info:
Applied Physics Letters 91, 062910 (2007)
Date:
2007-07-16
DOI:
http://dx.doi.org/10.1063/1.2768887

Author Information

Name Institution
Ji-Hoon AhnKorea Advanced Institute of Science and Technology
Ja-Yong KimKorea Advanced Institute of Science and Technology
Sang-Won KangKorea Advanced Institute of Science and Technology
Jin-Hyock KimHynix Semiconductor
Jae-Sung RohHynix Semiconductor

Films

Plasma SrTiO3

Hardware used: Unknown
Sr(DPM)2, Strontium(II) bis(2,2,6,6-tetramethyl-3,5-heptanedionate)
CAS#: 36830-74-7
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 225C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku

Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: Keithley 590 CV Analyzer

Characteristic: EOT, Equivalent Oxide Thickness
Analysis: C-V, Capacitance-Voltage Measurements
Diagnostic: Keithley 590 CV Analyzer

Substrates

Ru
SrRuO

Notes

1326