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Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry

Type:
Journal
Info:
Scientific Reports 10:10392 (2020)
Date:
2020-05-20
DOI:
http://dx.doi.org/10.1038/s41598-020-66409-8

Author Information

Name Institution
Ufuk KılıçUniversity of Nebraska
Alyssa MockUniversity of Nebraska
Derek SekoraUniversity of Nebraska
Simeon GilbertUniversity of Nebraska
Shah ValloppillyUniversity of Nebraska
Natale IannoUniversity of Nebraska
Marjorie LangellUniversity of Nebraska
Eva SchubertUniversity of Nebraska
Mathias SchubertUniversity of Nebraska

Films

Other WO3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten
CAS#: 406462-43-9
H2O, Water
CAS#: 7732-18-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 430C

Plasma TiO2

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku Smartlab

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instruments Nanoscope III

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000FI

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000FI

Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000FI

Substrates

Si(100)

Notes

1493