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The Plasma Enhanced Atomic Layer Deposition Publication Database is developed and maintained by Plasma ALD, LLC, a developer and supplier of inductively coupled plasma (ICP) sources for plasma-enhanced atomic layer deposition (PEALD), atomic layer etch (ALE), thin-film etching, surface cleaning, surface modification, and research plasma systems.

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BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s).

NumberTitle
1Plasma-enhanced atomic layer deposition of tungsten nitride
2In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
3The important role of water in growth of monolayer transition metal dichalcogenides
4Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
5WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
6Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
7Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
8Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
9Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
10Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
11Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
12Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
13Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
14Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
15Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
16Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
17Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
18Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
19Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
20Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
21Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
22Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma