Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s).

NumberTitle
1Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
2Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
3Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
4Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
5The important role of water in growth of monolayer transition metal dichalcogenides
6Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
7Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
8Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
9Plasma-enhanced atomic layer deposition of tungsten nitride
10Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
11WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
12Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
13Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
14Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
15Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
16In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
17Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
18Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
19Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
20Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
21Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
22Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys