Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten, CAS# 406462-43-9

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 22 record(s).

NumberTitle
1WNx Film Prepared by Atomic Layer Deposition using F-Free BTBMW and NH3 Plasma Radical for ULSI Applications
2Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
3Characteristics of Tungsten Carbide Films Prepared by Plasma-Assisted ALD Using Bis(tert-butylimido)bis(dimethylamido)tungsten
4Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
5Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry
6Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
7Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
8In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
9Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
10Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
11Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers
12Optical and electrical properties of Al:WS2 films prepared by atomic layer deposition and vulcanization
13Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
14Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
15Plasma-enhanced atomic layer deposition of tungsten nitride
16Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
17Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
18Controlling transition metal atomic ordering in two-dimensional Mo1-xWxS2 alloys
19Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
20Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
21The important role of water in growth of monolayer transition metal dichalcogenides
22Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques