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The important role of water in growth of monolayer transition metal dichalcogenides

Type:
Journal
Info:
2D Materials 4 (2017) 021024
Date:
2017-02-08
DOI:
https://doi.org/10.1088/2053-1583/aa5f4d

Author Information

Name Institution
Christoph KastlLawrence Berkeley National Laboratory
Christopher T ChenLawrence Berkeley National Laboratory
Tevye R KuykendallLawrence Berkeley National Laboratory
Brian ShevitskiLawrence Berkeley National Laboratory
Thomas P DarlingtonLawrence Berkeley National Laboratory
Nicholas J BorysLawrence Berkeley National Laboratory
Andrey KrayevAIST-NT
P James SchuckLawrence Berkeley National Laboratory
Shaul AloniLawrence Berkeley National Laboratory
Adam M. SchwartzbergLawrence Berkeley National Laboratory

Films

Plasma WO3

Hardware used: Oxford Instruments FlexAL
BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten
CAS#: 406462-43-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 40-200C

Plasma MoOx

Hardware used: Oxford Instruments FlexAL
Molybdenum hexacarbonyl, Mo(CO)6
CAS#: 13939-06-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 40-200C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Substrates

SiO2

Notes

1036