Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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Molybdenum hexacarbonyl, Mo(CO)6, CAS# 13939-06-5

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 9 record(s).

NumberTitle
1Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
2Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition
3The important role of water in growth of monolayer transition metal dichalcogenides
4Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
5Controllable synthesis of molybdenum tungsten disulfide alloy for vertically composition-controlled multilayer
6Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
7Influence of plasma power on deposition mechanism and structural properties of MoOx thin films by plasma enhanced atomic layer deposition
8Atomic Layer Deposition of V1-xMoxO2 Thin Films, Largely Enhanced Luminous Transmittance, Solar Modulation
9Molybdenum Disulfide Catalytic Coatings via Atomic Layer Deposition for Solar Hydrogen Production from Copper Gallium Diselenide Photocathodes