Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


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WO3 Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications discussing WO3 films returned 15 record(s).

NumberTitle
1Room temperature plasma enhanced atomic layer deposition for TiO2 and WO3 films
2Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry
3Scaled, Ferroelectric Memristive Synapse for Back-End-of-Line Integration with Neuromorphic Hardware
4Large area, patterned growth of 2D MoS2 and lateral MoS2-WS2 heterostructures for nano- and opto-electronic applications
5Top-down fabrication of fluorine-doped tin oxide nanopillar substrates for solar water splitting
6Effect of cycling on ultra-thin HfZrO4, ferroelectric synaptic weights
7In situ x-ray photoelectron emission analysis of the thermal stability of atomic layer deposited WOx as hole-selective contacts for Si solar cells
8Layer-controlled and atomically thin WS2 films prepared by sulfurization of atomic-layer-deposited WO3 films
9Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
10The important role of water in growth of monolayer transition metal dichalcogenides
11Improvement of Gas-Sensing Performance of Large-Area Tungsten Disulfide Nanosheets by Surface Functionalization
12Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma
13Thermal Stability of Novel Hole-Selective Contacts for Silicon Wafer Solar Cells
14Very High Refractive Index Transition Metal Dichalcogenide Photonic Conformal Coatings by Conversion of ALD Metal Oxides
15Layer-Controlled, Wafer-Scale, and Conformal Synthesis of Tungsten Disulfide Nanosheets Using Atomic Layer Deposition