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Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers

Type:
Journal
Info:
ACS Materials Lett. 2020, 2, 511-518
Date:
2020-04-08
DOI:
http://dx.doi.org/10.1021/acsmaterialslett.0c00093

Author Information

Name Institution
Shashank BalasubramanyamEindhoven University of Technology
Marc J. M. MerkxEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology
Adriaan J. M. MackusEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Plasma WS2

Hardware used: Oxford Instruments FlexAL
BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten
CAS#: 406462-43-9
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
Acetylacetone
CAS#: 123-54-6
Deposition Temperature = 250C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000F

Characteristic: Area Selectivity
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific KA1066 spectrometer

Characteristic: Area Selectivity
Analysis: Raman Spectroscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

SiO2
Al2O3
NbS2
Nb2O5
MoOx
MoS2
TiS2
TiO2
HfO2

Notes

1495