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Atomic Layer Deposition of Large-Area Polycrystalline Transition Metal Dichalcogenides from 100°C through Control of Plasma Chemistry

Type:
Journal
Info:
Chem. Mater. 2022, 34, 7280-7292
Date:
2022-07-21
DOI:
http://dx.doi.org/10.1021/acs.chemmater.2c01154

Author Information

Name Institution
Miika MattinenEindhoven University of Technology
Farzan GityTyndall National Institute, University College Cork
Emma ColemanTyndall National Institute, University College Cork
Joris F. A. VonkEindhoven University of Technology
Marcel A. VerheijenEindhoven University of Technology
Ray DuffyTyndall National Institute, University College Cork
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films

Plasma MoS2

Hardware used: Oxford Instruments FlexAL
Bis(t-butylimido)bis(dimethylamino)molybdenum
CAS#: 923956-62-1
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature Range = 50-450C

Plasma WS2

Hardware used: Oxford Instruments FlexAL
BTBMW, TBIDMW, bis(t-Butylimido) bis(DiMethylamido) Tungsten
CAS#: 406462-43-9
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 150C

Plasma TiSx

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 100C

Thermal TiSx

Hardware used: Oxford Instruments FlexAL
TDMATi, tetrakis(dimethylamido)titanium, titanium dimethylamide, (Me2N)4Ti
CAS#: 3275-24-9
H2S, Hydrogen Sulfide
CAS#: 7783-06-4
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000F

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Diagnostic: Signatone

Characteristic: Carrier Concentration
Analysis: Hall effect/van der Pauw method
Diagnostic: Lakeshore 8404 HMS

Characteristic: Mobility
Analysis: Hall effect/van der Pauw method
Diagnostic: Lakeshore 8404 HMS

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Sigma

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Bruker Dimension ICON

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Raman Spectroscopy
Diagnostic: Renishaw Invia Raman

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo Scientific K-Alpha

Characteristic: Density
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL JEM ARM 200

Substrates

SiO2
Quartz
PET, Polyethylene Terephthalate
Al2O3

Notes

1744