Edge-Site Nanoengineering of WS2 by Low-Temperature Plasma-Enhanced Atomic Layer Deposition for Electrocatalytic Hydrogen Evolution
Info:
Chem. Mater. 2019, 31, 5104-5115
Author Information
Films
Film/Plasma Properties
Analysis: TEM, Transmission Electron Microscope
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: RBS, Rutherford Backscattering Spectrometry
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: HAADF, High-Angle Annular Dark Field
Analysis: SEM, Scanning Electron Microscopy
Analysis: XRD, X-Ray Diffraction
Analysis: OES, Optical Emission Spectroscopy
Analysis: Linear Sweep Voltammetry
Substrates
Notes