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Lifetime improvement of micro-fabricated alkali vapor cells by atomic layer deposited wall coatings

Type:
Journal
Info:
Surface & Coatings Technology 221 (2013) 158 - 162
Date:
2013-01-23
DOI:
http://dx.doi.org/10.1016/j.surfcoat.2013.01.044

Author Information

Name Institution
S. WoetzelLeibniz Institute of Photonic Technology
Florian TalkenbergLeibniz Institute of Photonic Technology
T. ScholtesLeibniz Institute of Photonic Technology
R. IJsselsteijnLeibniz Institute of Photonic Technology
V. SchultzeLeibniz Institute of Photonic Technology
Hans-Georg MeyerLeibniz Institute of Photonic Technology

Films

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Plasma SiO2

Hardware used: Oxford Instruments OpAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Plasma TiO2

Hardware used: Oxford Instruments OpAL
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 120C

Film/Plasma Properties

Characteristic: Transmittance
Analysis: Optical Transmission
Diagnostic: Custom

Characteristic: Reflectivity
Analysis: Optical Reflectivity
Diagnostic: Custom

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Substrates

Silicon
Borofloat 33 Glass

Notes

Anodic bonding worked for substrates coated with Al2O3 and SiO2 but not TiO2.
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