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High-Reflective Coatings For Ground and Space Based Applications

Type:
Journal
Info:
ICSO 2014
Date:
2014-10-07
DOI:
http://congrexprojects.com/Custom/ICSO/2014/Papers/1.%20Tuesday%207%20October/Session%203B%20Filters-%20Coatings%20-%20Gratings/2.68333_Schuermann.pdf

Author Information

Name Institution
M. SchürmannFraunhofer Institute for Applied Optics and Precision Engineering
S. SchwindeFraunhofer Institute for Applied Optics and Precision Engineering
P. J. JobstFraunhofer Institute for Applied Optics and Precision Engineering
O. StenzelFraunhofer Institute for Applied Optics and Precision Engineering
S. WilbrandtFraunhofer Institute for Applied Optics and Precision Engineering
Adriana SzeghalmiFriedrich-Schiller-Universität Jena
Astrid BingelFraunhofer Institute for Applied Optics and Precision Engineering
Peter MunzertFraunhofer Institute for Applied Optics and Precision Engineering
Norbert KaiserFraunhofer Institute for Applied Optics and Precision Engineering

Films

Plasma Al2O3

Hardware used: Oxford Instruments OpAL
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Plasma SiO2

Hardware used: Oxford Instruments OpAL
3DMASi, (Me2N)3SiH, [(CH3)2N]3SiH, Tris(DiMethylAmido) Silane
CAS#: 15112-89-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Reflectance Spectra
Analysis: Optical Reflectivity
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Transmittance
Analysis: Optical Transmission
Diagnostic: PerkinElmer lambda 950 Spectrophotometer

Characteristic: Damage, Defects
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Sigma

Characteristic: Damage, Defects
Analysis: Optical Microscopy
Diagnostic: Leica CTR 6000

Characteristic: Refractive Index
Analysis: -
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: Zeiss Sigma

Characteristic: Film Stress
Analysis: Wafer Curvature
Diagnostic: Tencor

Characteristic: Chemical Composition, Impurities
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Varian 3100 FTIR

Substrates

Ag

Notes

456