Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide

Type:
Journal
Info:
Nanotechnology 26 024003
Date:
2014-10-17
DOI:
http://dx.doi.org/10.1088/0957-4484/26/2/024003

Author Information

Name Institution
Stephan RatzschFriedrich-Schiller-Universität Jena

Films

Plasma TiO2

Hardware used: Oxford Instruments OpAL
Deposition Temperature Range N/A

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: -

Characteristic: Images
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: -

Characteristic: Unknown
Analysis: Raman Spectroscopy
Diagnostic: -

Substrates

Silicon
SiO2

Notes

Oxford Instruments OpAL study of TiO2 morphology as a function of O2 plasma properties.
263