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Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection

Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (5) C132-C138 (2011)
Date:
2011-01-27

Author Information

Name Institution
Stephen E. PottsEindhoven University of Technology
L. SchmalzFEM Research Institute
M. FenkerFEM Research Institute
B. Dí­azFrench National Centre for Scientific Research (CNRS)
J. ŚwiatowskaFrench National Centre for Scientific Research (CNRS)
V. MauriceFrench National Centre for Scientific Research (CNRS)
A. SeyeuxFrench National Centre for Scientific Research (CNRS)
P. MarcusFrench National Centre for Scientific Research (CNRS)
György Zoltán RadnócziResearch Institute for Technical Physics and Materials Science
L. TóthResearch Institute for Technical Physics and Materials Science
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Al2O3


Thermal Al2O3


Film/Plasma Properties

Characteristic: Porosity
Analysis: CV, Cyclic Voltammetry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Compositional Depth Profiling
Analysis: TOF-SIMS, Time of Flight Secondary Ion Mass Spectrometry

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Adhesion
Analysis: TEM, Transmission Electron Microscope

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Corrosion
Analysis: NSS, Neutral Salt Spray

Substrates

Al2024-T3 Aluminium
100Cr6 Steel

Notes

699