Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Stephen E. Potts Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by Stephen E. Potts returned 7 record(s).

NumberTitle
1Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
2Energy-enhanced atomic layer deposition for more process and precursor versatility
3Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films
4Plasma-Enhanced ALD of TiO2 Using a Novel Cyclopentadienyl Alkylamido Precursor [Ti(CpMe)(NMe2)3] and O2 Plasma
5Ultra-Thin Aluminium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition for Corrosion Protection
6Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor
7Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N2 Plasma