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Electron-selective contacts via ultra-thin organic interface dipoles for silicon organic heterojunction solar cells

Type:

Journal

Info:

Journal of Applied Physics 123, 024505 (2018)

Date:

2017-12-21

DOI:

http://dx.doi.org/10.1063/1.5010937

Author Information

Name	Institution
Christian Reichel	Fraunhofer Institute for Solar Energy Systems (ISE)
Uli Würfel	Fraunhofer Institute for Solar Energy Systems (ISE)
Kristina Winkler	Fraunhofer Institute for Solar Energy Systems (ISE)
Hans-Frieder Schleiermacher	Fraunhofer Institute for Solar Energy Systems (ISE)
Markus Kohlstädt	Fraunhofer Institute for Solar Energy Systems (ISE)
Moritz Unmüssig	University of Freiburg
Christoph A. Messmer	Fraunhofer Institute for Solar Energy Systems (ISE)
M. Hermle	Fraunhofer Institute for Solar Energy Systems (ISE)
S. W. Glunz	Fraunhofer Institute for Solar Energy Systems (ISE)

Films

Plasma Al₂O₃

Hardware used: Oxford Instruments OpAL

TMA, Trimethylaluminum, Trimethylalumane, AlMe₃, Al(CH₃)₃

CAS#: 75-24-1

CAS#: 7782-44-7

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Silicon

Notes

1079