Effect of in situ hydrogen plasma treatment on zinc oxide grown using low temperature atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 31, 01A124 (2013)
Date:
2012-11-02
Author Information
| Name | Institution |
|---|---|
| Tae-Hoon Jung | Dankook University |
| Jin-Seong Park | Dankook University |
| Dong-Ho Kim | Korea Institute of Materials Science |
| Yongsoo Jeong | Korea Institute of Materials Science |
| Sung-Gyu Park | Korea Institute of Materials Science |
| Jung-Dae Kwon | Korea Institute of Materials Science |
Films
Other ZnO
Film/Plasma Properties
Characteristic: Resistivity, Sheet Resistance
Analysis: van der Pauw sheet resistance
Characteristic: Carrier Concentration
Analysis: van der Pauw sheet resistance
Characteristic: Mobility
Analysis: van der Pauw sheet resistance
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Silicon |
| Glass |
Notes
| 642 |