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The Sandwich Structure of Ga-Doped ZnO Thin Films Grown via H2O-, O2-, and O3-Based Atomic Layer Deposition

Type:
Journal
Info:
ECS J. Solid State Sci. Technol. 2013 volume 2, issue 9, Q182-Q186
Date:
2013-06-13
DOI:
http://dx.doi.org/10.1149/2.043309jss

Author Information

Name Institution
Yueh-Lin LeeNational Tsing Hua University
Tzu-Hsuan HuangNational Tsing Hua University
Chong-Lung HoNational Tsing Hua University
Meng-Chyi WuNational Tsing Hua University

Films

Thermal Ga:ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
H2O, Water
CAS#: 7732-18-5
Deposition Temperature Range = 200-350C

Thermal Ga:ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
O3, Ozone
CAS#: 10028-15-6
Deposition Temperature Range = 200-350C

Plasma Ga:ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
TEG, triethyl galium, GaEt3
CAS#: 1115-99-7
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range = 200-350C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Profilometry
Diagnostic: Tencor Alpha-Step Profilometer

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Diagnostic: -

Characteristic: Mobility
Analysis: Hall Measurements
Diagnostic: -

Characteristic: Carrier Concentration
Analysis: Hall Measurements
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Microstructure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: -

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Rigaku RU-H3R

Characteristic: Optical Properties
Analysis: Spectrophotometry
Diagnostic: -

Substrates

Glass

Notes

589