Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2017, 9 (39), pp 33429-33436
Date:
2017-04-17
Author Information
| Name | Institution |
|---|---|
| Matthew D. Sampson | Argonne National Laboratory |
| Jonathan D. Emery | Argonne National Laboratory |
| Michael J. Pellin | Argonne National Laboratory |
| Alex B. F. Martinson | Argonne National Laboratory |
Films
Thermal Al2O3
Other Al2O3
Thermal MnOx
Other MnOx
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 101923-26-6
CAS#: 7732-18-5
CAS#: 1333-74-0
Thermal ZnO
Other ZnO
Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
CAS#: 557-20-0
CAS#: 7732-18-5
CAS#: 1333-74-0
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XRF, X-Ray Fluorescence
Substrates
| Silicon |
| Au |
| 1-Dodecanethiol |
Notes
| 1399 |