Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Bis(ethylcyclopentadienyl)manganese, CAS# 101923-26-6

Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s).

NumberTitle
1Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide