Inductively coupled plasma sources from Plasma ALD, LLC.


Ideal for plasma enhanced atomic layer deposition and other surface engineering applications.


Contact us for more information.

Highly Tunable Electrical Properties in Undoped ZnO Grown by Plasma Enhanced Thermal-ALD

Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2012, 4(6), pp 3122-3128
Date:
2012-05-11
DOI:
http://dx.doi.org/10.1021/am300458q

Author Information

Name Institution
Matthew A. ThomasUniversity of Arkansas at Little Rock
J.B. CuiUniversity of Arkansas at Little Rock

Films

Plasma ZnO

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
DEZ, diethyl zinc, ZnEt2
CAS#: 557-20-0
H2O, Water
CAS#: 7732-18-5
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7000F

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7000F

Characteristic: Optical Properties
Analysis: PL, PhotoLuminescence
Diagnostic: Custom

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: -

Characteristic: Resistivity, Sheet Resistance
Analysis: Hall effect/van der Pauw method
Diagnostic: Custom

Characteristic: Mobility
Analysis: Hall effect/van der Pauw method
Diagnostic: Custom

Characteristic: Carrier Concentration
Analysis: Hall effect/van der Pauw method
Diagnostic: Custom

Substrates

Notes

24